Semiconductor

With the continuous development of semiconductor technology, the demand for micro nano processing technology is increasing day by day. Laser, especially ultrafast laser, with its unparalleled sharpness, unparalleled accuracy, and excellent processing capability, can handle various micro nano processing tasks, such as micro hole processing, micro groove processing, etc., precisely meeting the urgent demand for high-precision and high-efficiency processing solutions in the semiconductor field.

The Shenglei Leonis infrared picosecond series laser can be applied to wafer cutting and TGV drilling. The POD function ensures high consistency in the processing, uniform cutting lines, consistent hole spacing, and even hole spacing.

Figure 1 TGV micropore diagram

Figure 2 TGV borehole outline drawing

Related Products

Hercules 20 Series

Pulse Duration <240fs; Average power 5W-40W; Pulse Energy 5μJ-100μJ; Wavelength 1030nm/515nm/343nm

Hercules 30 Series

Pulse Duration <300fs; Average power 10W-30W; Pulse Energy 30μJ-300μJ; Wavelength 1030nm/515nm/343nm

Hercules 80 Series

Pulse Duration <600fs; Average power 30W-80W; Pulse Energy 30μJ-500μJ; Wavelength 1030nm/515nm/343nm

Hercules 300 Series

Pulse Duration <400fs; Average power 120W-300W; Pulse Energy 120μJ-2000μJ; Wavelength 1030nm/515nm

Leonis 15 Series

Pulse Duration <10ps; Average power 5W-15W; Pulse Energy 15μJ-150μJ; Wavelength 1064nm/532nm/355nm

Leonis 80 Series

Pulse Duration <15ps; Average power 30W-80W; Pulse Energy 30μJ-1000μJ; Burst Energy 1mJ-4mJ@Burst 4; Wavelengths 1064nm/532nm/355nm

  • toolbar
    Tel:13911893352
  • toolbar
    E-Mail:zhangguoxin@super-wave.com.cn
  • toolbar
    toolbar
  • toolbar
    Top